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ASTM F 1709 : 1997 : R2002

M00050868

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ASTM F 1709 : 1997 : R2002

SPECIFICATION FOR HIGH PURITY TITANIUM SPUTTERING TARGETS FOR ELECTRONIC THIN FILM APPLICATIONS

American Society for Testing and Materials

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Abstract

CONTAINED IN VOL. 10.04, 2016 Defines pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

General Product Information

Document Type Standard
Status Current
Publisher American Society for Testing and Materials
ProductNote Reconfirmed 2002
Committee F 01