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ASTM F 1709 : 1997
M00052131
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ASTM F 1709 : 1997
SPECIFICATION FOR HIGH PURITY TITANIUM SPUTTERING TARGETS FOR ELECTRONIC THIN FILM APPLICATIONS
American Society for Testing and Materials
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Abstract
CONTAINED IN VOL. 10.04, 2016 Defines pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
General Product Information
| Document Type | Standard |
| Status | Current |
| Publisher | American Society for Testing and Materials |
| ProductNote | Reconfirmed 1997 |
| Committee | F 01 |