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BS ISO 17109 : 2015

M00016806

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BS ISO 17109 : 2015

SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - METHOD FOR SPUTTER RATE DETERMINATION IN X-RAY PHOTOELECTRON SPECTROSCOPY, AUGER ELECTRON SPECTROSCOPY AND SECONDARY-ION MASS SPECTROMETRY SPUTTER DEPTH PROFILING USING SINGLE AND MULTI-LAYER THIN FILMS

British Standards Institution

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Table of Contents

Foreword<br>Introduction<br>1 Scope<br>2 Normative references<br>3 Terms and definitions<br>4 Requirement of single- and multi-layer reference<br>&nbsp;&nbsp;thin films<br>5 Determination of sputtering rate<br>Annex A (informative) - Report of international Round<br>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;Robin Test<br>Annex B (informative) - Prediction of the rates for a wide<br>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;range of other materials through tabulated values<br>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;of sputtering yields<br>Bibliography

Abstract

Defines a method for the calibration of the sputtered depth of a material from a measurement of its sputtering rate under set sputtering conditions using a single- or multi-layer reference sample with layers of the same material as that requiring depth calibration.

General Product Information

Document Type Standard
Status Current
Publisher British Standards Institution
Committee CII/60
Supersedes
  • 14/30266479 DC : 0