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IEC 62047-25 : 1ED 2016

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IEC 62047-25 : 1ED 2016

SEMICONDUCTOR DEVICES - MICRO-ELECTROMECHANICAL DEVICES - PART 25: SILICON BASED MEMS FABRICATION TECHNOLOGY - MEASUREMENT METHOD OF PULL-PRESS AND SHEARING STRENGTH OF MICRO BONDING AREA

International Electrotechnical Committee

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Table of Contents

FOREWORD<br>1 Scope<br>2 Normative references<br>3 Terms and definitions<br>4 Requirements<br>5 Testing method<br>Annex A (informative) - Dimensions for testing<br>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;structure and tensile/compressive strength<br>Annex B (informative) - Pull-press testing method<br>&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;&nbsp;example

Abstract

Defines the in-situ testing method to measure the bonding strength of micro bonding area which is fabricated by micromachining technologies used in silicon-based micro-electromechanical system (MEMS).

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Document Type Standard
Status Current
Publisher International Electrotechnical Committee
Committee TC 47