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ISO 17560 : 2014

M00023121

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ISO 17560 : 2014

SURFACE CHEMICAL ANALYSIS - SECONDARY-ION MASS SPECTROMETRY - METHOD FOR DEPTH PROFILING OF BORON IN SILICON

International Organization for Standardization

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Table of Contents

Foreword
Introduction
1 Scope
2 Normative reference
3 Symbols and abbreviations
4 Principle
5 Reference materials
6 Apparatus
7 Specimen
8 Procedure
9 Expression of results
10 Test report
Annex A (informative) - Statistical report of stylus
        profilometry measurements
Bibliography

Abstract

Defines a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration.

General Product Information

Document Type Standard
Status Current
Publisher International Organization for Standardization
Committee TC 201
Supersedes
  • ISO/DIS 17560 : 60.00 (2014)