Table of Contents

Foreword
Introduction
1 Scope
2 Terms, definitions, symbols and abbreviated terms
3 Instrumental requirements, alignment and
  positioning guidelines
4 Data collection and storage
5 Data analysis
6 Information required when reporting XRR analysis
Annex A (informative) - Example of report for an
        oxynitrided silicon wafer
Bibliography

Abstract

Describes a method for the evaluation of thickness, density and interface width of single layer and multilayered thin films which have thicknesses between approximately 1 nm and 1 [mu]m, on flat substrates, by means of X-Ray Reflectometry (XRR).

General Product Information

Published
Document Type	Standard
Status	Current
Publisher	International Organization for Standardization
Pages
ISBN
Committee	TC 201
Supersedes	ISO/DIS 16413 : 60.00 (2013)