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ISO 16531 : 2013

M00027346

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ISO 16531 : 2013

SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - METHODS FOR ION BEAM ALIGNMENT AND THE ASSOCIATED MEASUREMENT OF CURRENT OR CURRENT DENSITY FOR DEPTH PROFILING IN AES AND XPS

International Organization for Standardization

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Table of Contents

Foreword
Introduction
1 Scope
2 Normative references
3 Terms, definitions, symbols and abbreviated terms
4 System requirements
5 Ion beam alignment methods
6 When to align and check ion beam alignment
Annex A (informative) - Comparison of AES depth profiles
        with good/poor ion beam alignment
Annex B (informative) - Alignment using cup with co-axial
        electrodes
Bibliography

Abstract

Describes methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy.

General Product Information

Document Type Standard
Status Current
Publisher International Organization for Standardization
Committee TC 201
Supersedes
  • ISO/DIS 16531 : 40.60 (2012)