M00027346
New product
SURFACE CHEMICAL ANALYSIS - DEPTH PROFILING - METHODS FOR ION BEAM ALIGNMENT AND THE ASSOCIATED MEASUREMENT OF CURRENT OR CURRENT DENSITY FOR DEPTH PROFILING IN AES AND XPS
International Organization for Standardization
In stock
Warning: Last items in stock!
Availability date: 11/05/2021
Foreword
Introduction
1 Scope
2 Normative references
3 Terms, definitions, symbols and abbreviated terms
4 System requirements
5 Ion beam alignment methods
6 When to align and check ion beam alignment
Annex A (informative) - Comparison of AES depth profiles
with good/poor ion beam alignment
Annex B (informative) - Alignment using cup with co-axial
electrodes
Bibliography
Describes methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy.
Published | |
Document Type | Standard |
Status | Current |
Publisher | International Organization for Standardization |
Pages | |
ISBN | |
Committee | TC 201 |
Supersedes |
|