Table of Contents

Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
5 Principle
6 Reference materials
7 Apparatus
8 Specimen
9 Procedures
10 Expression of results
11 Test report
Annex A (informative) - Report of round robin test of depth
        profiling of arsenic in silicon
Annex B (normative) - Procedures for the depth profiling of
        NIST SRM 2134
Bibliography

Abstract

Describes a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of arsenic in silicon, and using stylus profilometry or optical interferometry for depth calibration.

General Product Information

Published
Document Type	Standard
Status	Current
Publisher	International Organization for Standardization
Pages
ISBN
Committee	TC 201
Supersedes	ISO/DIS 12406 : 60.00 (2010)