M00028984
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SURFACE CHEMICAL ANALYSIS - PROPOSED PROCEDURE FOR CERTIFYING THE RETAINED AREIC DOSE IN A WORKING REFERENCE MATERIAL PRODUCED BY ION IMPLANTATION
International Organization for Standardization
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Availability date: 11/05/2021
Foreword
Introduction
1 Scope
2 Normative references
3 Terms and definitions
4 Symbols and abbreviated terms
5 Concept and procedure
6 Requirements
7 Certification
Annex A (informative) - Ion implantation
Annex B (informative) - Ion-implantation dosimetry
Annex C (informative) - X-ray fluorescence spectrometry
Annex D (informative) - Non-certified secondary reference
materials and substitutes
Annex E (informative) - Uncertainties in measurements of
areic dose
Bibliography
Describes a procedure for the certification of the areic dose of an ion-implanted analyte element of atomic number larger than that of silicon retained in a working reference material (WoRM) intended for surface-analytical use.
Published | |
Document Type | Standard |
Status | Current |
Publisher | International Organization for Standardization |
Pages | |
ISBN | |
Committee | TC 201 |